Dual Head System |
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Dual Head System |
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| Category |
Laser marking system |
| Product |
Dual Head System |
| Application fields |
Marking |
Supplying precise and high contrast marking, the
Dual Head System is uniquely designed with two
scanner heads. With overlapping marking fields for
JEDEC trays and lead frames, the Dual Head System
is ideal for the semiconductor industry. Identical results
are achieved within both marking fields with adjustable
power distribution on the scanner heads.
The Dual Head System is available in various versions for
synchronous and asynchronous marking, such as beam
switch (time sharing) and beam splitter (power sharing).
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Technical Data
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Unit |
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| Wavelengths |
nm |
355, 532 or 1064 |
| Available configurations |
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SBS: Synchronous beam splitter
ABS: Asynchronous beam splitter
ABX: Beam switch |
| Marking speed |
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up to 2,800 characters per second |
Standard marking field size
(1064nm) |
inch (mm) |
13 x 7 (330 x 180) |
| Positioning accurancy |
µm |
± 75 |
| Dimensions |
inch (mm) |
29 x 13 x 12
(735 x 330 x 305) |
| Ambient temperature |
°F (°C) |
59 - 104 (15 - 40) |
| Safety class |
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IP54 |
| Compliance |
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DIN EN ISO 9001:2000
SEMI S2 S8 |
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 Back to marking lasers overview
To request further information, please contact
TRUMPF TruMark
Phone: (877) 232-9334
Fax: (860) 255-6681
E-mail: trumark@us.trumpf.com
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